BLA(Blue Laser Annealing) line beam
ㆍCompany : AP system
ㆍMaximum Scan Size : 6 inch wafer
ㆍLaser power : 11.44 W (Maximum)
ㆍWavelength : 445nm
ㆍLaser diodes : 3 W (20 pieces)
ㆍBeam size (LA x SA) : 520 um x 20 um
ㆍScan Speed : ~400 mm/s
ㆍCW(Continuous-Wave) Laser

Company : Ptl
Model. No: Precision glass scriber

Sample Size : < 370 x 470 mm
Scribing with alignment : < 150 x 150 mm
Sample thickness : < 1.0T

Company : ㈜한국포장기계
Model. No: HK-301

Sample Size : < 450 x 600 mm

Mask Substrate Type : Quartz / Sodalime / Film
Substrate Size : 6 inch x 6 inch
Data Window Size : 13cm x 13cm
Mask Size : 7 inch x 7 inch
Substrate Thickness : 0.7 T
Mask Thickness : 150 MIL (1 MIL=1/1000 inch)
Data Format : GDS
Mask Image Type : Positive / Negative
Metal Line Width : > 3um (Film mask는 별도 문의)
Via Hole Size : > 4um x 4um (Film mask는 별도 문의)