Backplane TFT

ADRC Technology Introduction for ADRC process

Advanced Display Research Center (ADRC) is leading the

world in field of display research.

  A total of 40 processes are registered.
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a-Si:H deposition
PECVD System
(Plasma-enhanced chemical vapor deposition)

Model. No : AMAT P-5000 (PRECISION 5000)
Company : APPLIED MATERIALS

Substrate size : < 15cm X 15cm
Deposition thickness : Max 200 nm/Time
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SiNx, SiO₂ deposition
PECVD System
(Plasma-enhanced chemical vapor deposition)

Model. No : AMAT P-5000 (PRECISION 5000)
Company : APPLIED MATERIALS

Substrate size : < 15cm X 15cm
Deposition thickness : Max 200 nm/Time
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Cu, Ti, Mo, Al, IZO, ITO deposition
DC sputtering system

Model. No : AMAT P-5000 (PRECISION 5000)
Company : APPLIED MATERIALS

Substrate size : < 15cm X 15cm
Deposition thickness : Max. 200 nm/Time
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Ag, Ni, Ti depositions
[Manual sputter]
Company : SAM WON Vacuum
Substrate size : < 15cm X 15cm
Target size : 8-inch
Material : Ag, Ni, Ti
Vacuum gauge : 10-5 Torr
Thickness : Max. 100 nm/time
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PIN deposition
PECVD System
(Plasma-enhanced chemical vapor deposition)

Model. No : AMAT P-5000 (PRECISION 5000)
Company : APPLIED MATERIALS

Substrate size : < 15cm X 15cm
Deposition thickness : Max 700 nm/Time
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